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SiO2 Return on a page
Silicon Dioxide
|
CAS.NO. |
Purity |
Density |
Melting Point |
Refractive Index |
Tansmission Range |
Evaporation Temperature |
|
7631-86-9 |
99.99% |
2.202 g/cm3 |
1700℃ |
1.46/550nm |
200-8000nm |
1600-2200℃ |
|
Specs |
1-3mm,3*5mm,Granule, ¢2*2mm,¢3*3mm,,Cylindric, Dia.3mm,Pellet |
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|
Application |
Multi-layer coatings, filters, anti-reflection coatings, beam splitters, films for capacitors. etc. |
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|
Evaporation with |
electron beam gun |
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|
Remark |
Size can be custom-made |
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Evaporation materials (145)
Sputtering Targets (209)
- Metal targets (67)
- Alloy targets (32)
- Ceramic targets (79)
Powders (18)
wafers (10)
others (6)




