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HfO2 Return on a page
Hafnium Oxide
|
CAS.NO. |
Purity |
Density |
Melting Point |
Refractive Index |
Tansmission Range |
Evaporation Temperature |
|
12055-23-1 |
99.99% |
9.68-9.90 g/cm3 |
2812℃ |
2.15/250nm, 2/500nm |
220-12000nm |
2600-2800℃ |
|
Specs |
1-3mm Granule, Dia.8*5mm, Dia.20*8mm,Tablet |
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Application |
A.R coatings, interference coatings for the UV |
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Evaporation with |
electron-beam gun |
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Remark |
Size can be custom-made |
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Evaporation materials (145)
Sputtering Targets (209)
- Metal targets (67)
- Alloy targets (32)
- Ceramic targets (79)
Powders (18)
wafers (10)
others (6)




