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Ta2O5 Return on a page
Tantalum Oxide
|
CAS.NO. |
Purity |
Density |
Melting Point |
Refractive Index |
Tansmission Range |
Evaporation Temperature |
|
1314-61-0 |
99.99% or 99.9% |
8.7 g/cm3 |
1800℃ |
2.1/500nm |
400-8000nm |
2000℃ |
|
Specs |
1-3mm,Granule, Dia.8*3mm,Tablet |
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|
Application |
A.R Coatings ,interference filters |
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|
Evaporation with |
Electron-beam gun |
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Remark |
Size can be custom-made |
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Evaporation materials (145)
Sputtering Targets (209)
- Metal targets (67)
- Alloy targets (32)
- Ceramic targets (79)
Powders (18)
wafers (10)
others (6)




